Equipment

UC Berkeley

CHA Electron Beam Evaporator
Description: The 6-pocket electron beam evaporation system is for depositing high purity thin metal films and will be restricted to low to mid volatility metals such as Au, Pt, Pd, Ti, Ni, Cr.
Location: Marvell Nanofabrication Laboratory
Access: Available for use by Nanolab members. For non-Berkeley Center members, request access from Theme Leaders.

FEI NanoSEM 650 Scanning Electron Microscope
Description: The FEI NanoSEM 650 is a high performance scanning electron microscope capable of 0.8nm resolution at 30 kV. The SEM is equipped with a conventional Everhart-Thornley secondary electron detector as well as an in-lens secondary and retractable directional back scatter detector. The system can be used for imaging of non-conductive specimens without preparation or coating using a low vacuum mode with a Helix low vacuum secondary electron detector. Using sample bias, continuously adjustable landing energy is possible from 30kV down to 50V. The sample chamber can accommodate up to an 8inch wafer and has in integrated in situ plasma cleaner.
Location: Marvell Nanofabrication Laboratory, 1st floor of Sutardja Dai Hall
Access: Available for use by Nanolab members. For non-Berkeley Center members, request access from Theme Leaders.

Cambridge Fiji Atomic Layer Deposition (ALD) System
Description: The Cambridge Fiji ALD is capable of both thermal and plasma enhanced atomic layer deposition. The tool has been set up initially to deposit Ru (ruthenium), TiN (titanium nitride) and provide back up capability for Al2O3 (aluminum oxide). Additional materials that will be explored are Ni (nickel) and Pt (platinum). The tool can handle from pieces up to 8" diameter wafers.
Location: Marvell Nanofabrication Laboratory
Access: Available for use by Nanolab members. For non-Berkeley Center members, request access from Theme Leaders.

Ion Milling System
Estimated arrival date: Oct 2012


MIT

Admet MTEST Quattro System
Description: Mechanical materials tester (stress versus strain)
Location: Prof Jeff Lang’s lab (10-171)
Access: Request access from Prof Lang

WYKO NT 9100 Series Profiler by Veeco
Description: A white-light interferometer used to measure fine scale movement
Location: Prof Vladimir Bulovic’s lab
Access: Request access from Prof Bulovic

IV/CV Parameter Analyzer
Description: This is an Agilent B1500 IV/CV parameter analyzer with new triaxial probes (Cascade DCP100) for low noise/low current measurements. The triaxial probes bring the force and sense capability very close to the DUT for more accurate measurements. The probes also allow probing of small pads ~15x15um. Most importantly CV measurements can made with lower noise thanks to new proper cable termination afforded by the new probe setup.
Location: Antoniadis Measurement Lab (38-387)
Access: Open access to all, subject to availability and training

Elionix ELS-F125 Electron-Beam Lithography System
Description: The tool has excellent resolution and overlay accuracy, high throughput, capability for mix-and-match optical/e-beam lithography and can process pieces and wafers up to 8” in diameter.
Location: Microsystems Technology Lab (24-041)
Access: Open access to all

Oxford Instruments FlexAL Atomic Layer Deposition System
Description: This system is capable of both Thermal and Plasma-assisted ALD. Initially set-up to deposit Al2O3, HfO2, TiO2, TiN, and WN on semiconductors without Au. The tool handles pieces and wafers up to 8” in diameter.
Location: Microsystems Technology Lab (24-041)
Access: Open access to all


Stanford

Electron Beam Evaporator
Description: Dedicated for carbon deposition
Location: Prof Philip Wong’s lab (Paul Allen, Room 108X)
Access: Request access from Prof Wong